NOTICE OF INTENT-BMF HF Vapor Etcher

The National Institute of Standards and Technology (NIST) intends to negotiate with Idonus Sarl for a BMF HF Vapor Etcher. The BMF currently has a vapor etching system, but it can only accept substrates with a maximum size of 100 mm wafers. The BMF requires a new HF vapor etcher that can accept substrates up to 150 mm wafers. The NAICS Code for this requirement is 334516, Analytical Laboratory Manufacturing. * The BMF needs a new HF vapor etcher with the ability to accept larger substrates. * The current system can only accept substrates with a maximum size of 100 mm wafers. * The new system must have the same capabilities as the existing vapor etcher, but with the ability to accept larger substrates. * The procurement is justified due to the safety concerns associated with HF vapor etching.