Prospective Grant of Exclusive Patent License 12-009-EX1

The National Institute of Standards and Technology (NIST) is contemplating the grant of an exclusive license to Julia Jean LLC for NIST's interest in several patents and patent applications related to cold cathode electron field emitters based on silicon carbide structures. The prospective exclusive license territory may be worldwide, and the field of use may be limited to research, development, manufacturing, and commercialization of licensed products. • The license will be royalty-bearing and will comply with the terms and conditions of 35 U.S.C. 209 and 37 CFR 404.7. • The prospective exclusive license may be granted unless NIST receives written evidence and argument that the grant of the license would not be consistent with the requirements of 35 U.S.C. 209 and 37 CFR 404.7 within 15 days from the date of the published notice. • Comments or applications for a license must be received by the NIST Technology Partnerships Office on or before July 1, 2026.