Electron Beam Lithography System & Direct Write Laser Lithography System

The contract is for the provision of an Electron Beam Lithography System and a Direct Write Laser Lithography System. The systems will be used for precise fabrication of micro- and nanoscale structures. The contract was awarded to Raith, and the statement of intent to award a contract becomes effective on 10/3/2025. The contract is for the Florida State University, and any inquiries or protests should be addressed to the Chief Procurement Officer. • The Electron Beam Lithography System must be capable of sub-10 nm patterning and have a user-friendly software interface. • The Direct Write Laser Lithography System must be capable of writing fine patterns on wafers or substrates without the need for photomasks. • The systems will be utilized for precise fabrication of micro- and nanoscale structures. • The contract is for a single award, and the vendor is expected to provide the systems and support as specified in the ITN.