Description
Argonne National Laboratory is seeking a domestic supplier to provide a single custom‑fabricated gold nanostructured target. The target must be a 1‑inch super‑flat silicon substrate with a 3 µm critical dimension grating, gold contrast material, a 5 nm chromium adhesion layer, and feature heights ranging from 20 nm to 250 nm. The part must be manufactured in the United States, with both raw materials and final product originating domestically. Production is to be performed using electron‑beam lithography followed by lift‑off processing. The solicitation includes extensive representation and certification clauses (Buy American Act, small‑business status, conflict‑of‑interest, data rights, etc.) that the offeror must comply with.
• Item: Gold Nanostructured Target – 1 unit
• Substrate: 1‑inch Superflat Si, micro‑roughness < 0.5 nm rms
• Layers: Cr (5 nm) adhesion, Au contrast material
• Grating: 3 µm critical dimension, feature height 20‑250 nm, fabricated by e‑beam + lift‑off
• Must be 100 % domestic (materials & manufacturing)
• Includes standard federal certifications (FAR, Buy American, etc.)
• No explicit price or delivery schedule provided; compliance with SAM registration required.