NOTICE OF INTENT TO SOLE SOURCE: One (1) Chemical Vapor Deposition (CVD) System

The U.S. Army Research Laboratory is seeking to acquire one Chemical Vapor Deposition (CVD) System. The system should have a two-zone split furnace capable of reaching temperatures of at least 1200 degrees Celsius, a 50 millimeter quartz tube and vacuum flanges, a four-channel gas control system with a Programmable Logic Controller (PLC) touch panel and PC operating software, and a heavy-duty double stage rotary vane vacuum pump with exhaust filter capable of pumping 240 liters per minute. The system should be fully compatible with existing MTI Corporation hardware and software found in the laboratory. • The system should have a two-zone split furnace capable of reaching temperatures of at least 1200 degrees Celsius. • The system should include a 50 millimeter quartz tube and vacuum flanges. • The system should include a four-channel gas control system with a Programmable Logic Controller (PLC) touch panel and PC operating software. • The system should include a heavy-duty double stage rotary vane vacuum pump with exhaust filter capable of pumping 240 liters per minute. • The system should be fully compatible with existing MTI Corporation hardware and software found in the laboratory.