CHIPS R&D Custom Diffractometry and Fourier Ptychography Endstation

The National Institute of Standards and Technology (NIST) seeks a qualified vendor to design, fabricate, deliver, install, and commission a custom diffractometry and Fourier ptychography end‑station for extreme‑ultraviolet (EUV) metrology. The system must include a high‑vacuum chamber, camera‑manipulation stages, wafer‑manipulation stages, optional upgrades (e.g., EUV camera, additional motion axes), and on‑site installation/training. Delivery is to NIST’s Gaithersburg campus with a performance period from July 1 2026 to September 30 2027. The contract is unrestricted competition and will be awarded on a firm‑fixed‑price basis. • Custom vacuum chamber (28” × 40” interior, high‑vacuum capability < 7.5 × 10⁻⁷ Torr) • Camera manipulation stage with ≥4 DOF (motorized and manual) and closed‑loop control • Wafer manipulation stage with ≥2 motorized DOF, optional extra axes (ZR, XY) • Optional integration of a dedicated EUV camera (2k × 2k, ≥85 % QE) • On‑site installation, testing, and training for up to two NIST users • Deliverables include detailed CAD drawings, final hardware, and documentation • Period of performance: 15 months; delivery within 120 days of order receipt; warranty ≥1 year