CHIPS- Nanometer-scale Planar Films and Measurements

The National Institute of Standards and Technology (NIST) is conducting market research to identify responsible sources capable of providing high-quality thin oxide, nitride, and epitaxial germanide films on silicon wafers, along with associated metrology data. The CHIPS Metrology Program develops and advances cutting-edge metrology capabilities for members of the U.S. semiconductor manufacturing ecosystem. NIST is seeking information from sources capable of providing solutions that meet the objectives described in the notice, including the deposition of thin films and the measurement of their properties using various techniques. The notice includes detailed technical specifications for the required products and services, including substrate, film deposition, and wafer characterization requirements. • The notice is seeking information on the availability of small businesses, including socio-economic categories. • The notice is seeking information on industry capabilities, limitations, and optimization approaches. • The notice is seeking information to inform the development of draft specifications and acquisition strategy. • The notice is seeking information to assess the competitiveness of the requirement.