Description
Lawrence Berkeley National Laboratory’s Advanced Light Source division is seeking market input on vendors capable of delivering a custom high‑vacuum electron‑beam evaporation system, including installation, to support thin‑film deposition for beamline instrumentation. This RFI is for information gathering only; no contract or funding is attached at this stage. Respondents must demonstrate prior experience delivering comparable systems that meet the preliminary specifications and must submit technical literature by the response deadline. The system must accommodate a 1‑meter throw distance, a dedicated substrate load‑lock for 200 mm × 40 mm × 50 mm substrates, an in‑situ motorized tilting stage (±95°), dual ion‑beam sources (gridded and gridless), and fit within an 8 ft × 7 ft × 7.5 ft envelope with ≤208 V three‑phase, 100 A power.
• Target user‑facility equipment for synchrotron‑light research (materials, chemistry, biology, energy).
• Must include load‑lock, motorized tilt stage, and dual ion‑beam capability.
• Physical envelope: ≤8 ft L × 7 ft W × 7.5 ft H; electrical: ≤208 V, 100 A three‑phase.
• Response due: 5:00 PM PT, September 25 2026 via email to Karen Tays.
• No funds available; submission is voluntary and may be publicly disclosed.